JPH0154883B2 - - Google Patents
Info
- Publication number
- JPH0154883B2 JPH0154883B2 JP8981280A JP8981280A JPH0154883B2 JP H0154883 B2 JPH0154883 B2 JP H0154883B2 JP 8981280 A JP8981280 A JP 8981280A JP 8981280 A JP8981280 A JP 8981280A JP H0154883 B2 JPH0154883 B2 JP H0154883B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- electrode
- thickness
- substrate
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 28
- 238000005530 etching Methods 0.000 claims description 20
- 239000007772 electrode material Substances 0.000 claims description 12
- 238000010884 ion-beam technique Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000010897 surface acoustic wave method Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 description 29
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 230000008569 process Effects 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 4
- 239000012212 insulator Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 238000000992 sputter etching Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002592 echocardiography Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8981280A JPS5715514A (en) | 1980-07-01 | 1980-07-01 | Manufacture for reed screen electrode for elastic surface wave |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8981280A JPS5715514A (en) | 1980-07-01 | 1980-07-01 | Manufacture for reed screen electrode for elastic surface wave |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5715514A JPS5715514A (en) | 1982-01-26 |
| JPH0154883B2 true JPH0154883B2 (en]) | 1989-11-21 |
Family
ID=13981136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8981280A Granted JPS5715514A (en) | 1980-07-01 | 1980-07-01 | Manufacture for reed screen electrode for elastic surface wave |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5715514A (en]) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4577169A (en) * | 1984-08-01 | 1986-03-18 | At&T Bell Laboratories | Small ripple surface acoustic wave filter with low insertion loss |
| JPH02149114A (ja) * | 1988-11-30 | 1990-06-07 | Nippon Dempa Kogyo Co Ltd | 弾性表面波装置 |
| JP2684214B2 (ja) * | 1989-04-28 | 1997-12-03 | 株式会社村田製作所 | 表面波装置 |
| US5923231A (en) * | 1994-08-05 | 1999-07-13 | Kinseki Limited | Surface acoustic wave device with an electrode insulating film and method for fabricating the same |
| JP3308749B2 (ja) * | 1995-01-27 | 2002-07-29 | 日本電気株式会社 | 弾性表面波装置の製造方法、および、これを用いて製造された弾性表面波装置 |
-
1980
- 1980-07-01 JP JP8981280A patent/JPS5715514A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5715514A (en) | 1982-01-26 |
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